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Title: Measurement of energy transfer at an isolated substrate in a pulsed dc magnetron discharge

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.2779287· OSTI ID:21062081
; ; ;  [1]
  1. Department of Electrical Engineering and Electronics, University of Liverpool, Brownlow Hill, Liverpool L69 3GJ (United Kingdom)

The power density delivered by particles to an electrically isolated substrate in an asymmetric bipolar pulsed dc unbalanced magnetron has been quantified. The plasma source was operated in argon with a titanium target, and measurements were made using both a calorimeter probe and time-resolved Langmuir probe incorporated into a specially made substrate holder. The main results from the calorimeter probe show clearly that with increased pulse frequency (from dc to 350 kHz) and reduced duty cycle (90%-50%), the particle power density (from ions, electrons, sputtered Ti, and backscattered Ar) at the substrate increases significantly. For instance, at 350 kHz and 60% duty cycle, the total power density is 83 mW/cm{sup 2}, about 60% higher than in dc mode for the same time-average discharge power. However, from an inventory of the individual particle contributions to the total power density derived from time-resolved Langmuir measurements and a simple model of the substrate sheath and plasma internal processes, we predict values of power density much lower than those measured. The measured and calculated values are in close agreement for the results obtained in dc mode but diverge at high frequencies. It is believed that this is due to the Langmuir probe measurements being unable to observe the presence of high-energy ions, created during the transient peaks in the electron temperature at the transitions from on off and off on [J. W. Bradley et al., Plasma Sources Sci. Technol. 11, 165 (2002)] which subsequently bombard the substrate. This paper shows conclusively the benefit of pulsing the magnetron over and above dc operation for enhancing the ion power per depositing neutral in the ion assisted deposition process.

OSTI ID:
21062081
Journal Information:
Journal of Applied Physics, Vol. 102, Issue 6; Other Information: DOI: 10.1063/1.2779287; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English

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