A time-resolved Langmuir double-probe method for the investigation of pulsed magnetron discharges

Journal Article · Wed Dec 15 04:00:00 EST 2004 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.1808481· OSTI ID:20662201

Welzel, Th; Dunger, Th; Kupfer, H; Richter, F ^[1]

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1. Institut fuer Physik, Technische Universitaet Chemnitz, D-09107 Chemnitz (Germany)

Langmuir probes are important means for the characterization of plasma discharges. For measurements in plasmas used for the deposition of thin films, the Langmuir double probe is especially suited. With the increasing popularity of pulsed deposition discharges, there is also an increasing need for time-resolved characterization methods. For Langmuir probes, several single-probe approaches to time-resolved measurements are reported but very few for the double probe. We present a time-resolved Langmuir double-probe technique, which is applied to a pulsed magnetron discharge at several 100 kHz used for MgO deposition. The investigations show that a proper treatment of the current measurement is necessary to obtain reliable results. In doing so, a characteristic time dependence of the charge-carrier density during the ''pulse on'' time containing maximum values of almost 2{center_dot}10{sup 11} cm{sup -3} was found. This characteristic time dependence varies with the pulse frequency and the duty cycle. A similar time dependence of the electron temperature is only observed when the probe is placed near the magnesium target.

• OSTI ID: 20662201
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 12 Vol. 96; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
CHARGE CARRIERS
DEPOSITION
ELECTRIC DISCHARGES
ELECTRON TEMPERATURE
ION TEMPERATURE
KHZ RANGE 100-1000
LANGMUIR PROBE
MAGNESIUM
MAGNESIUM OXIDES
MAGNETRONS
PLASMA
PLASMA DENSITY
PULSES
THIN FILMS
TIME DEPENDENCE
TIME RESOLUTION