Effect of ion bombarding energies on photocatalytic TiO{sub 2} films growing in a pulsed dual magnetron discharge

Journal Article · Sun May 15 04:00:00 EDT 2011 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.3563612· OSTI ID:22051170

Novak, Ondrej; Vlcek, Jaroslav ^[1]

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1. Department of Physics, University of West Bohemia, Univerzitni 22, 306 14 Plzen (Czech Republic)

Photocatalytic crystalline TiO{sub 2} films were deposited by a pulsed dc dual magnetron system. The depositions were performed using two unbalanced magnetrons with planar titanium targets of 50 mm diameter in Ar+O{sub 2} gas mixtures at a total pressure of 0.9 Pa with oxygen partial pressures ranging from 0.2 to 0.9 Pa. The maximum substrate surface temperature was 160 deg. C Both magnetrons operated in the same asymmetric bipolar mode at the repetition frequencies of 100 and 350 kHz with a fixed 50% duty cycle and the average target power densities of 52-74 W cm{sup -2} in the negative voltage phase of the pulses, but the magnetron operations were shifted by a half of the period. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. The measured structure of the ion energy distributions was correlated with the distinct pulse phases of the magnetron discharges. A decrease in the energy delivered by fast ions (E{>=}10 eV) to the unit volume of the growing films, together with possible effects of plasma-chemical processes, during the depositions at the oxygen partial pressures of 0.5-0.75 Pa and the repetition frequency of 350 kHz resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO{sub 2} films.

• OSTI ID: 22051170
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 3 Vol. 29; ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
DEPOSITION
ELECTRIC DISCHARGES
ENERGY SPECTRA
EV RANGE
ION BEAMS
KHZ RANGE
MAGNETRONS
MASS SPECTROSCOPY
OXYGEN
PARTIAL PRESSURE
PHOTOCATALYSIS
PLASMA
POWER DENSITY
PULSED IRRADIATION
SPUTTERING
THIN FILMS
TITANIUM
TITANIUM OXIDES