Effects of the growth conditions on the roughness of amorphous hydrogenated carbon films deposited by plasma enhanced chemical vapor deposition

Journal Article · Wed Nov 15 04:00:00 EST 2006 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.2362723· OSTI ID:20853811

Capote, G; Prioli, R; Freire, Jr, F L ^[1]

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1. Departamento de Fisica, Pontificia Universidade Catolica do Rio de Janeiro, 22453-900 Rio de Janeiro (Brazil)

The surface roughness and scaling behavior of a-C:H films deposited by plasma enhanced chemical vapor deposition from CH{sub 4}-Ar mixtures were studied using atomic force microscopy. Raman spectroscopy gives some insights about the film microstructure. The film surface roughness is shown to decrease with the increase of deposition negative self-bias, while the presence of Ar ions enhances this effect. An analysis of the film surface and scaling behavior suggests that there is a transition of the mechanism of the film growth from a random deposition with surface diffusion process to a thermal spike based process that occurs upon the increase of the negative self-bias voltage and the argon bombardment.

• OSTI ID: 20853811
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 6 Vol. 24; ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ARGON
ARGON IONS
ATOMIC FORCE MICROSCOPY
CARBON
CHEMICAL VAPOR DEPOSITION
COATINGS
DIFFUSION
FILMS
METHANE
MICROSTRUCTURE
MIXTURES
PLASMA
RAMAN SPECTROSCOPY
ROUGHNESS
SCALING
SURFACES