Influence of krypton atoms on the structure of hydrogenated amorphous carbon deposited by plasma enhanced chemical vapor deposition

Journal Article · Wed Dec 15 04:00:00 EST 2010 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3526000· OSTI ID:21537988

Oliveira, Jr, M H ^[1]; Viana, G A; Marques, F C ^[1]; Cros, A; Cantarero, A ^[2]

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1. Instituto de Fisica Gleb Wataghin, Universidade Estadual de Campinas-UNICAMP, C. P. 6165, Campinas, Sao Paulo 13083-970 (Brazil)
2. Institut de Ciencia dels Materials, Universitat de Valencia, E-46071 Valencia (Spain)

Hydrogenated amorphous carbon (a-C:H) films were prepared by plasma enhanced chemical vapor deposition using methane (CH{sub 4}) plus krypton (Kr) mixed atmosphere. The depositions were performed as function of the bias voltage and krypton partial pressure. The goal of this work was to study the influence of krypton gas on the physical properties of a-C:H films deposited on the cathode electrode. Krypton concentration up to 1.6 at. %, determined by Rutherford Back-Scattering, was obtained at high Kr partial pressure and bias of -120 V. The structure of the films was analyzed by means of optical transmission spectroscopy, multi-wavelength Raman scattering and Fourier Transform Infrared spectroscopy. It was verified that the structure of the films remains unchanged up to a concentration of Kr of about 1.0 at. %. A slight graphitization of the films occurs for higher concentration. The observed variation in the film structure, optical band gap, stress, and hydrogen concentration were associated mainly with the subplantation process of hydrocarbons radicals, rather than the krypton ion energy.

• OSTI ID: 21537988
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 12 Vol. 108; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ALKANES
AMORPHOUS STATE
BACKSCATTERING
CARBON
CHARGED PARTICLES
CHEMICAL COATING
CHEMICAL REACTIONS
CHEMICAL VAPOR DEPOSITION
DEPOSITION
ELEMENTS
ENERGY GAP
FILMS
FLUIDS
FOURIER TRANSFORM SPECTROMETERS
GASES
GRAPHITIZATION
HYDROCARBONS
HYDROGENATION
INFRARED SPECTRA
ION IMPLANTATION
IONS
KRYPTON
KRYPTON IONS
MEASURING INSTRUMENTS
METHANE
NONMETALS
ORGANIC COMPOUNDS
PARTIAL PRESSURE
PHYSICAL PROPERTIES
RAMAN EFFECT
RAMAN SPECTRA
RARE GASES
RUTHERFORD BACKSCATTERING SPECTROSCOPY
SCATTERING
SPECTRA
SPECTROMETERS
SPECTROSCOPY
SURFACE COATING
THERMODYNAMIC PROPERTIES
THIN FILMS
WAVELENGTHS