Arsenic activation in molecular beam epitaxy grown, in situ doped HgCdTe(211)
- EPIR Technologies Inc., Bolingbrook, Illinois 60440 (United States)
Photovoltaic p-n junctions are the most significant active components of both current infrared photodetectors and advanced ones being developed. It is of the utmost importance to control both p- and n-type extrinsic doping. This letter addresses the issue of activating arsenic as a p-type dopant of Hg{sub 1-x}Cd{sub x}Te at temperatures sufficiently low that the integrity of p-n junctions and the intrinsic advantages of molecular beam epitaxy as a growth technique will not be compromised. The p-type activation of arsenic in (211)B Hg{sub 1-x}Cd{sub x}Te is reported after a two-stage anneal at temperatures below 300 deg. C for Cd compositions suitable for the sensing of long wavelength infrared radiation.
- OSTI ID:
- 20702399
- Journal Information:
- Applied Physics Letters, Vol. 86, Issue 21; Other Information: DOI: 10.1063/1.1940119; (c) 2005 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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