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Title: Extended x-ray absorption fine structure study of arsenic in HgCdTe: p-type doping linked to nonsubstitutional As incorporation in an unknown AsHg{sub 8} structure

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3255989· OSTI ID:21361922
;  [1];  [2]
  1. CEA-INAC, 17 Av. des Martyrs, 38054 Grenoble Cedex 9 (France)
  2. CEA-LETI-Minatec, 17 Av. des Martyrs, 38054 Grenoble Cedex 9 (France)

An extended x-ray absorption fine structure (EXAFS) investigation has been carried out on arsenic-doped Hg{sub 70}Cd{sub 30}Te samples. The incorporation of atomic arsenic has been achieved using a nonconventional radio-frequency plasma source in a molecular beam epitaxy reactor. Two samples from the same epitaxial wafer have been studied. One underwent a 400 deg. C activation annealing under Hg pressure, leading to n to p-type conversion. In the commonly admitted scenario, this conversion is associated with the annealing-induced migration of As from a Hg site to a Te site. This study shows that this is not the case. Before annealing, As is found to be involved in noncrystalline structures: 50% inside an As{sub 2}Te{sub 3} chalcogenide glass and 50% inside a new AsHg{sub 8} compact structure. After annealing, the As{sub 2}Te{sub 3} chalcogenide glass disappears, 31% of As occupies Hg sites and 69% incorporates inside this new AsHg{sub 8} compact structure that occupies Te sites. The EXAFS results are in excellent agreement with 77 K Hall-effect measurements. The new AsHg{sub 8} structure is found to have an acceptor behavior. Overall, this study provides an entirely new vision of extrinsic p-type doping of HgCdTe as well as the first experimental evidence of As site transfer induced by annealing.

OSTI ID:
21361922
Journal Information:
Journal of Applied Physics, Vol. 106, Issue 10; Other Information: DOI: 10.1063/1.3255989; (c) 2009 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English