Design And Performance Of An X-ray Undulator Beamline PF-AR-NW2
- Photon Factory, Institute of Materials Structure Science, High Energy Accelerator Research Organization, 1-1 Oho, Tsukuba, Ibaraki 305-0801 (Japan)
An X-ray undulator beamline PF-AR-NW2, which is used for time-resolved XAFS and/or x-ray diffraction experiments and also high-flux XAFS and/or diffraction experiments, has been designed and constructed. The insertion device is an in-vacuum undulator at a period of 40 mm, and the number of periods is 90 in order to cover an energy range of 5 {approx} 25 keV. Main optical components are a double-crystal monochromator and a mirror system. The double-crystal monochromator consists of flat Si (111) crystals, which are cooled by liquid nitrogen. The mirror system consists of focusing and cut-off mirror systems. The commissioning has been done successfully. The focused beam size with a bent cylindrical mirror is about 0.21 mm x 0.55 mm for vertically and horizontally with the intensity of 6.4 x 1012 photons/s at 12.4 keV. The vertical beam size focused with a bent flat mirror is about 0.06 mm. We compare the performance with the values from a ray-tracing calculation.
- OSTI ID:
- 20652925
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 705; ISSN APCPCS; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ACCELERATORS
BEAM OPTICS
COMMISSIONING
COMPARATIVE EVALUATIONS
CRYSTALS
CYLINDRICAL CONFIGURATION
DESIGN
EQUIPMENT
FOCUSING
KEV RANGE 10-100
MIRRORS
NITROGEN
PERFORMANCE
PHOTONS
STORAGE RINGS
SYNCHROTRON RADIATION
TIME RESOLUTION
X RADIATION
X-RAY DIFFRACTION