Double crystal monochromator for x-ray undulator beamline at the PF-AR
Journal Article
·
· AIP Conference Proceedings
- Photon Factory, Institute of Materials Structure Science, KEK, Tsukuba 305-0801 (Japan)
The design and performance of a new double crystal monochromator for x-ray undulator beamline at the PF-AR are described. The monochromator consists of flat silicon (111) crystals, which are cooled by liquid nitrogen in order to reduce the deformation caused by a heat load problem. One of the characteristic points of the monochromator is a usage of a relatively long size of second silicon crystal ({approx}200mm long) along the beam direction. The long crystal makes it possible to eliminate a mechanical translation stage, which is needed to realize the fixed exit position for the monochromatized x-rays. The simplicity of the designing contributes to the stability of the monochromator, and there is no problem about vibration and so on. The fixed exit can be achieved by the adjustment of the height of the first crystal. It is possible to keep the deviation of the beam position at the experimental hatch less than 0.01 mm and 0.075mm at vertical and horizontal directions, respectively, under scanning the monochromatized energy from 5 to 20 keV.
- OSTI ID:
- 20653036
- Journal Information:
- AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 705; ISSN APCPCS; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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