Chemical Vapor Deposition of Zirconium Compounds: A Review

Lamm, Benjamin Weitkamp; Mitchell, David Joseph

doi:10.3390/coatings13020266

Chemical Vapor Deposition of Zirconium Compounds: A Review

Journal Article · Sun Jan 22 23:00:00 EST 2023 · Coatings

DOI:https://doi.org/10.3390/coatings13020266· OSTI ID:1928958

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Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)

Coatings of zirconium compounds are used in a wide variety of fields, yet an understanding and descriptions of deposition mechanisms are scant in the public literature. The mechanisms of deposition for metallic zirconium, ZrC, ZrN, ZrO₂, ZrB₂, and zirconium silicides are discussed based on the direct vapor deposition research of those compounds where possible or compared to complementary titanium systems when direct research is lacking. Both inorganic and organometallic deposition systems are discussed. As a class of compounds, an understanding of the vapor deposition mechanisms can be significantly improved by investigations on metallic zirconium deposition by zirconium halides and hydrogen and by in situ analysis techniques such as Fourier-transform infrared (FTIR) spectroscopy or x-ray photoelectron spectroscopy (XPS).

View Accepted Manuscript (DOE)

Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE Laboratory Directed Research and Development (LDRD) Program

Grant/Contract Number:: AC05-00OR22725

OSTI ID:: 1928958

Journal Information:: Coatings, Journal Name: Coatings Journal Issue: 2 Vol. 13; ISSN 2079-6412

Publisher:: MDPICopyright Statement

Country of Publication:: United States

Language:: English

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