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Vapor transport of zirconium and silicon during heat-treatment of Zircaloy in silica

Journal Article · · J. Electrochem. Soc.; (United States)
DOI:https://doi.org/10.1149/1.2129642· OSTI ID:5509870

When pieces of Zircaloy are heated above 600/sup 0/C in sealed silica capsules, silicon is deposited on the Zircaloy surface as zirconium silicides and zirconium is deposited on the silica in two forms: as an oxide layer in the high temperature region and as a metallic mirror on lower temperature surfaces. Samples of Zircaloy were heated in silica capsules under various conditions and analyzed by scanning electron microscopy. The results indicate that the deposits resulted from vapor transport processes involving volatile zirconium and silicon fluorides. Residual fluoride on Zircaloy surfaces, remaining from acid pickling treatments, was observed by Auger electron spectroscopy and mass spectroscopy in amounts sufficient to cause the transport. The thermodynamics of the vapor transport reactions are in accord with the fluoride mechanism. 4 figures.

Research Organization:
SRI International, Menlo Park, CA
OSTI ID:
5509870
Journal Information:
J. Electrochem. Soc.; (United States), Journal Name: J. Electrochem. Soc.; (United States) Vol. 127:1; ISSN JESOA
Country of Publication:
United States
Language:
English