Recovery of EUVL substrates
Conference
·
OSTI ID:192433
Mo/Si multilayers, were removed from superpolished zerodur and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.
- Research Organization:
- Lawrence Livermore National Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 192433
- Report Number(s):
- UCRL-JC--119622; CONF-9409177--18; ON: DE96004584
- Country of Publication:
- United States
- Language:
- English
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