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Title: Recovery of EUVL substrates

Abstract

Mo/Si multilayers, were removed from superpolished zerodur and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.

Authors:
;
Publication Date:
Research Org.:
Lawrence Livermore National Lab., CA (United States)
Sponsoring Org.:
USDOE, Washington, DC (United States)
OSTI Identifier:
192433
Report Number(s):
UCRL-JC-119622; CONF-9409177-18
ON: DE96004584; TRN: 96:001577
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Conference
Resource Relation:
Conference: Optical Society of America conference on extreme ultraviolet lithography, Monterey, CA (United States), 19-21 Sep 1994; Other Information: PBD: 19 Jan 1995
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; SILICA; REFLECTIVITY; MOLYBDENUM; REMOVAL; SILICON; ETCHING; SUBSTRATES; ROUGHNESS; SURFACE PROPERTIES

Citation Formats

Vernon, S.P., and Baker, S.L. Recovery of EUVL substrates. United States: N. p., 1995. Web.
Vernon, S.P., & Baker, S.L. Recovery of EUVL substrates. United States.
Vernon, S.P., and Baker, S.L. Thu . "Recovery of EUVL substrates". United States. https://www.osti.gov/servlets/purl/192433.
@article{osti_192433,
title = {Recovery of EUVL substrates},
author = {Vernon, S.P. and Baker, S.L.},
abstractNote = {Mo/Si multilayers, were removed from superpolished zerodur and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Thu Jan 19 00:00:00 EST 1995},
month = {Thu Jan 19 00:00:00 EST 1995}
}

Conference:
Other availability
Please see Document Availability for additional information on obtaining the full-text document. Library patrons may search WorldCat to identify libraries that hold this conference proceeding.

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