Recovery of Mo/Si multilayer coated optical substrates

Patent · Mon Dec 15 23:00:00 EST 1997

OSTI ID:563699

Baker, S L; Vernon, S P; Stearns, D G

Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO{sub 2} overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates. 5 figs.

• Research Organization: University of California
• Sponsoring Organization: USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-48
• Assignee: Univ. of California, Oakland, CA (United States)
• Patent Number(s): US 5,698,113/A/
• Application Number: PAN: 8-607,055
• OSTI ID: 563699
• Country of Publication: United States
• Language: English

Related Subjects

43 PARTICLE ACCELERATORS
ACCELERATOR FACILITIES
COATINGS
EXTREME ULTRAVIOLET RADIATION
MATERIALS RECOVERY
MOLYBDENUM
OPTICAL PROPERTIES
OPTICAL SYSTEMS
REMOVAL
SILICON
SYNCHROTRON RADIATION SOURCES