Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors

Goldberg, Kenneth A.; Wojdyla, Antoine; Bryant, Diane

doi:10.3390/s21020536

Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors

Journal Article · Wed Jan 13 00:00:00 EST 2021 · Sensors

DOI:https://doi.org/10.3390/s21020536· OSTI ID:1764562

^[1]; ^[1]; Bryant, Diane ^[1]

Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States). Advanced Light Source (ALS)

New, high-coherent-flux X-ray beamlines at synchrotron and free-electron laser light sources rely on wavefront sensors to achieve and maintain optimal alignment under dynamic operating conditions. This includes feedback to adaptive X-ray optics. We describe the design and modeling of a new class of binary-amplitude reflective gratings for shearing interferometry and Hartmann wavefront sensing. Compact arrays of deeply etched gratings illuminated at glancing incidence can withstand higher power densities than transmission membranes and can be designed to operate across a broad range of photon energies with a fixed grating-to-detector distance. Coherent wave-propagation is used to study the energy bandwidth of individual elements in an array and to set the design parameters. We observe that shearing operates well over a ±10% bandwidth, while Hartmann can be extended to ±30% or more, in our configuration. We apply this methodology to the design of a wavefront sensor for a soft X-ray beamline operating from 230 eV to 1400 eV and model shearing and Hartmann tests in the presence of varying wavefront aberration types and magnitudes.

View Accepted Manuscript (DOE)

Research Organization:: Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES)

Grant/Contract Number:: AC02-05CH11231

OSTI ID:: 1764562

Journal Information:: Sensors, Journal Name: Sensors Journal Issue: 2 Vol. 21; ISSN 1424-8220

Publisher:: MDPI AGCopyright Statement

Country of Publication:: United States

Language:: English

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47 OTHER INSTRUMENTATION
aberrations
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Binary Amplitude Reflection Gratings for X-ray Shearing and Hartmann Wavefront Sensors

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