Bi-enhanced N incorporation in GaAsNBi alloys
- Univ. of Michigan, Ann Arbor, MI (United States)
- Alfred Univ., NY (United States)
- Los Alamos National Lab. (LANL), Los Alamos, NM (United States)
We have examined the influence of bismuth (Bi) and nitrogen (N) fluxes on N and Bi incorporation during molecular-beam epitaxy of GaAs1-x-yNxBiy alloys. The incorporation of Bi is found to be independent of N flux, while the total N incorporation and the fraction of N atoms occupying non-substitutional lattice sites increase with increasing Bi flux. A comparison of channeling nuclear reaction analysis along the [100], [110], and [111] directions with Monte Carlo-Molecular Dynamics simulations indicates that the non-substitutional N primarily incorporate as (N-As)As interstitial complexes. We discuss the influence of Bi adatoms on the formation of arsenic-terminated [110]-oriented step-edges and the resulting enhancement in total N incorporation via the formation of additional (N-As)As.
- Research Organization:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC). Basic Energy Sciences (BES) (SC-22)
- Grant/Contract Number:
- AC52-06NA25396
- OSTI ID:
- 1427392
- Report Number(s):
- LA-UR-18-21407; TRN: US1802856
- Journal Information:
- Applied Physics Letters, Vol. 110, Issue 24; ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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