Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser. Revision 1
- and others
We measured the conversion efficiency of laser pulse energy into keV x-rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Nd:glass slab laser capable of delivering 13 ns FWHM pulses at up to 20 J at 1.053 {mu}m and 12 J at 0.53 {mu}m. Targets where chosen to optimize emission in the l0--15 {angstrom} wavelength band, including L-shell emission from materials with atomic numbers in the range Z=24-30 and M-shell emission from Xe (Z=54). With 1.053 {mu}m a maximum conversion of 11% into 2{pi} sr was measured from solid Xe targets. At 0.527 {mu}m efficiencies of 12--18%/(2{pi}sr) were measured for all of the solid targets in the same wavelength band. The x-ray conversion efficiency from the Xe gas puff target was considerably lower, at about 3%/(2{pi}sr) when irradiated with 1.053 {mu}m.
- Research Organization:
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-48
- OSTI ID:
- 135528
- Report Number(s):
- UCRL-CR-121294-Rev.1; ON: DE96004050
- Resource Relation:
- Other Information: PBD: Jul 1995
- Country of Publication:
- United States
- Language:
- English
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