Dynamics and morphology of brittle cracks: A molecular-dynamics study of silicon nitride
Journal Article
·
· Physical Review Letters
- Concurrent Computing Laboratory for Materials Simulations, Department of Computer Science, Department of Physics and Astronomy, Louisiana State University, Baton Rouge, Louisiana 70803 (United States)
Crack propagation in amorphous Si{sub 3}N{sub 4} films is investigated with large-scale molecular-dynamics simulations on parallel machines. We observe a correlation between the speed of crack propagation and the morphology of fracture surfaces. Initially, as the crack propagates slowly, the roughness exponent for fracture surfaces is found to be 0.44. However, beyond a certain speed of crack propagation, the exponent crosses over to 0.8. This crossover behavior is similar to the recent experimental finding by Bouchaud and Naveos. {copyright} {ital 1995} {ital The} {ital American} {ital Physical} {ital Society}.
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FG05-92ER45477
- OSTI ID:
- 124836
- Journal Information:
- Physical Review Letters, Journal Name: Physical Review Letters Journal Issue: 17 Vol. 75; ISSN 0031-9007; ISSN PRLTAO
- Country of Publication:
- United States
- Language:
- English
Similar Records
Role of Ultrafine Microstructures in Dynamic Fracture in Nanophase Silicon Nitride
Dynamics and morphology of cracks in silicon nitride films: A molecular dynamics study on parallel computers
Dynamics and morphology of cracks in silicon nitride films: A molecular dynamics study on parallel computers
Journal Article
·
Fri Feb 28 23:00:00 EST 1997
· Physical Review Letters
·
OSTI ID:512725
Dynamics and morphology of cracks in silicon nitride films: A molecular dynamics study on parallel computers
Conference
·
Sat Nov 30 23:00:00 EST 1996
·
OSTI ID:400598
Dynamics and morphology of cracks in silicon nitride films: A molecular dynamics study on parallel computers
Conference
·
Mon Dec 30 23:00:00 EST 1996
·
OSTI ID:488965