Dynamics and morphology of cracks in silicon nitride films: A molecular dynamics study on parallel computers

Conference · Sun Dec 01 00:00:00 EST 1996

OSTI ID:400598

Nakano, Aiichiro; Kalia, R K; Vashishta, P ^[1]

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1. Louisiana State Univ., Baton Rouge, LA (United States)

Multiresolution molecular dynamics approach on parallel computers has been used to investigate fracture in ceramic materials. In microporous silica, critical behavior at fracture is analyzed in terms of pore percolation and kinetic roughening of fracture surfaces. Crack propagation in amorphous silicon nitride films is investigated, and a correlation between the speed of crack propagation and the morphology of fracture surfaces is observed. In crystalline silicon nitride films, temperature-assisted void formation in front of a crack tip slows down crack propagation.

• DOE Contract Number: FG05-92ER45477
• OSTI ID: 400598
• Report Number(s): CONF-951155-; ISBN 1-55899-312-6; TRN: IM9650%%3
• Resource Relation: Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Fracture -- Instability dynamics, scaling, and ductile/brittle behavior; Selinger, R.L.B.; Fuller, E.R. Jr. [eds.] [National Inst. of Standards and Technology, Gaithersburg, MD (United States)]; Mecholsky, J.J. [ed.] [Univ. of Florida, Gainesville, FL (United States)]; Carlsson, A.E. [ed.] [Washington Univ., Saint Louis, MO (United States)]; PB: 420 p.; Materials Research Society symposium proceedings, Volume 409
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
SILICON NITRIDES
FRACTURE PROPERTIES
SILICA
COMPUTER CALCULATIONS
PARALLEL PROCESSING
ALGORITHMS
POROSITY
CRACK PROPAGATION
AMORPHOUS STATE
BRITTLE-DUCTILE TRANSITIONS
NUCLEATION
VOIDS
CORRELATIONS