Dynamics and morphology of cracks in silicon nitride films: A molecular dynamics study on parallel computers

Conference · Tue Dec 31 00:00:00 EST 1996

OSTI ID:488965

Nakano, A; Kalia, R K; Vashishta, P ^[1]

---

1. Louisiana State Univ., Baton Rouge, LA (United States)

Multiresolution molecular dynamics approach on parallel computers has been used to investigate fracture in ceramic materials. In microporous silica, critical behavior at fracture is analyzed in terms of pore percolation and kinetic roughening of fracture surfaces. Crack propagation in amorphous silicon nitride films is investigated, and a correlation between the speed of crack propagation and the morphology of fracture surfaces is observed. In crystalline silicon nitride films, temperature-assisted void formation in front of a crack tip slows down crack propagation.

• Sponsoring Organization: USDOE, Washington, DC (United States); National Science Foundation, Washington, DC (United States); Department of the Air Force, Washington, DC (United States)
• DOE Contract Number: FG05-92ER45477
• OSTI ID: 488965
• Report Number(s): CONF-951155-; ISBN 1-55899-311-8; TRN: IM9728%%156
• Resource Relation: Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 27 Nov - 1 Dec 1995; Other Information: PBD: 1996; Related Information: Is Part Of Materials theory, simulations, and parallel algorithms; Kaxiras, E. [ed.] [Harvard Univ., Cambridge, MA (United States)]; Joannopoulos, J. [ed.] [Massachusetts Inst. of Tech., Cambridge, MA (United States)]; Vashishta, P.; Kalia, R.K. [eds.] [Louisiana State Univ., Baton Rouge, LA (United States)]; PB: 627 p.; Materials Research Society symposium proceedings, Volume 408
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
99 MATHEMATICS
COMPUTERS
INFORMATION SCIENCE
MANAGEMENT
LAW
MISCELLANEOUS
SILICON NITRIDES
SILICON OXIDES
FRACTURE MECHANICS
CALCULATION METHODS
PARALLEL PROCESSING
CRACK PROPAGATION