Semiconductor device PN junction fabrication using optical processing of amorphous semiconductor material
Patent
·
OSTI ID:1164345
Systems and methods for semiconductor device PN junction fabrication are provided. In one embodiment, a method for fabricating an electrical device having a P-N junction comprises: depositing a layer of amorphous semiconductor material onto a crystalline semiconductor base, wherein the crystalline semiconductor base comprises a crystalline phase of a same semiconductor as the amorphous layer; and growing the layer of amorphous semiconductor material into a layer of crystalline semiconductor material that is epitaxially matched to the lattice structure of the crystalline semiconductor base by applying an optical energy that penetrates at least the amorphous semiconductor material.
- Research Organization:
- National Renewable Energy Laboratory (NREL), Golden, CO (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC36-08GO28308
- Assignee:
- Alliance for Sustainable Energy, LLC (Golden, CO)
- Patent Number(s):
- 8,895,416
- Application Number:
- 13/793,626
- OSTI ID:
- 1164345
- Country of Publication:
- United States
- Language:
- English
Using silicon injection phenomenon during fire-through contact formation to improve process control and performance of screen-printed multicrystalline-silicon solar cells
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conference | June 2010 |
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