Method of patterning an aerogel
Patent
·
OSTI ID:1067880
- Edgewood, NM
A method for producing a pattern in an aerogel disposed as a coating on a substrate comprises exposing the aerogel coating to the vapors of a hydrophobic silane compound, masking the aerogel coating with a shadow photomask and irradiating the aerogel coating with ultraviolet (UV) irradiation. The exposure to UV through the shadow mask creates a pattern of hydrophobic and hydrophilic regions in the aerogel coating. Etching away the hydrophilic regions of the aerogel coating, preferably with a 1 molar solution of sodium hydroxide, leaves the unwetted and unetched hydrophobic regions of the aerogel layer on the substrate, replicating the pattern of the photomask. The hydrophobic aerogel pattern can be further exposed to UV irradiation if desired, to create a hydrophilic aerogel pattern.
- Research Organization:
- Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- 8,226,839
- Application Number:
- OSTI ID:
- 1067880
- Country of Publication:
- United States
- Language:
- English
Kinetics of the SiO2 aerogel dissolution in aqueous NaOH solutions: experiment and model
|
journal | December 1999 |
Inorganic Materials Chemistry Desk Reference
|
reference-book | November 2004 |
MEMS with thin-film aerogel
|
conference | January 2001 |
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