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Thick film hydrogen sensor

Patent ·
OSTI ID:106700

A thick film hydrogen sensor element includes an essentially inert, electrically-insulating substrate having deposited thereon a thick film metallization forming at least two resistors. The metallization is a sintered composition of Pd and a sinterable binder such as glass frit. An essentially inert, electrically insulating, hydrogen impermeable passivation layer covers at least one of the resistors. 8 figs.

Research Organization:
Lockheed Martin Energy Syst Inc
DOE Contract Number:
AC05-84OR21400
Assignee:
Martin Marietta Energy Systems, Inc., Oak Ridge, TN (United States)
Patent Number(s):
US 5,451,920/A/
Application Number:
PAN: 8-170,628
OSTI ID:
106700
Country of Publication:
United States
Language:
English

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