Method to fabricate a tilted logpile photonic crystal
- Albuquerque, NM
A method to fabricate a tilted logpile photonic crystal requires only two lithographic exposures and does not require mask repositioning between exposures. The mask and photoresist-coated substrate are spaced a fixed and constant distance apart using a spacer and the stack is clamped together. The stack is then tilted at a crystallographic symmetry angle (e.g., 45 degrees) relative to the X-ray beam and rotated about the surface normal until the mask is aligned with the X-ray beam. The stack is then rotated in plane by a small stitching angle and exposed to the X-ray beam to pattern the first half of the structure. The stack is then rotated by 180.degree. about the normal and a second exposure patterns the remaining half of the structure. The method can use commercially available DXRL scanner technology and LIGA processes to fabricate large-area, high-quality tilted logpile photonic crystals.
- Research Organization:
- Sandia Corporation (Albuquerque, NM)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- 7,820,365
- Application Number:
- 11/779,605
- OSTI ID:
- 1016015
- Country of Publication:
- United States
- Language:
- English
Similar Records
X-ray fabrication of nonorthogonal structures using {open_quotes}surface{close_quotes} masks
Microfocusing optics for hard x-rays fabricated by x-ray lithography