X-ray fabrication of nonorthogonal structures using {open_quotes}surface{close_quotes} masks
- Department of Electrical and Computer Engineering, University of Wisconsin, Madison, Wisconsin 53706 (United States)
- Argonne National Labs, Argonne, Illinois 60439 (United States)
Standard x-ray lithographic techniques allow great flexibility of geometry in two dimensions. Typically, the third dimension is limited to depth, which is purely orthogonal to the surface. We have been developing a relatively simple technique using x-ray lithography and have fabricated a whole family of precisely controlled nonorthogonal structures such as tapers, bridges and various {open_quotes}leaning{close_quotes} or blazed structures. Traditional soft x-ray masks, create the modulation required to print into x-ray resists by having the absorbing elements of the x-ray mask patterned on a thin membrane. This technique involves the creation of the gold absorbing elements of the x-ray mask directly on the surface of the photoresist, i.e., a {open_quotes}surface{close_quotes} mask. These surface masks can create nonorthogonal exposures creating blazed structures as well as {open_quotes}bridges{close_quotes} by tilting the sample with respect to the x-ray beam during exposure. The exposures can also be done while having the tilted sample rotated, creating tapered exposure profiles. In addition to the novel geometries, a potentially useful feature of the rotated exposures is that the sidewalls have nanometer scale smoothness, due to the averaging of intensities during rotation. {copyright} {ital 1997 American Vacuum Society.}
- OSTI ID:
- 550472
- Report Number(s):
- CONF-9705218--
- Journal Information:
- Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena Journal Issue: 6 Vol. 15; ISSN 0734-211X; ISSN JVTBD9
- Country of Publication:
- United States
- Language:
- English
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