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Title: X-ray fabrication of nonorthogonal structures using {open_quotes}surface{close_quotes} masks

Journal Article · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena
DOI:https://doi.org/10.1116/1.589676· OSTI ID:550472
; ;  [1];  [2]
  1. Department of Electrical and Computer Engineering, University of Wisconsin, Madison, Wisconsin 53706 (United States)
  2. Argonne National Labs, Argonne, Illinois 60439 (United States)

Standard x-ray lithographic techniques allow great flexibility of geometry in two dimensions. Typically, the third dimension is limited to depth, which is purely orthogonal to the surface. We have been developing a relatively simple technique using x-ray lithography and have fabricated a whole family of precisely controlled nonorthogonal structures such as tapers, bridges and various {open_quotes}leaning{close_quotes} or blazed structures. Traditional soft x-ray masks, create the modulation required to print into x-ray resists by having the absorbing elements of the x-ray mask patterned on a thin membrane. This technique involves the creation of the gold absorbing elements of the x-ray mask directly on the surface of the photoresist, i.e., a {open_quotes}surface{close_quotes} mask. These surface masks can create nonorthogonal exposures creating blazed structures as well as {open_quotes}bridges{close_quotes} by tilting the sample with respect to the x-ray beam during exposure. The exposures can also be done while having the tilted sample rotated, creating tapered exposure profiles. In addition to the novel geometries, a potentially useful feature of the rotated exposures is that the sidewalls have nanometer scale smoothness, due to the averaging of intensities during rotation. {copyright} {ital 1997 American Vacuum Society.}

OSTI ID:
550472
Report Number(s):
CONF-9705218-; ISSN 0734-211X; TRN: 9723M0096
Journal Information:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena, Vol. 15, Issue 6; Conference: 41. international conference on electron, ion, and photon beam technology and nanofabrication, Dana Point, CA (United States), 27-30 May 1997; Other Information: PBD: Nov 1997
Country of Publication:
United States
Language:
English