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X-ray mask and method for providing same

Patent ·
OSTI ID:874863
 [1];  [2]
  1. Pleasanton, CA
  2. Fremont, CA
+ Show Author Affiliations

The present invention describes a method for fabricating an x-ray mask tool which can achieve pattern features having lateral dimension of less than 1 micron. The process uses a thin photoresist and a standard lithographic mask to transfer an trace image pattern in the surface of a silicon wafer by exposing and developing the resist. The exposed portion of the silicon substrate is then anisotropically etched to provide an etched image of the trace image pattern consisting of a series of channels in the silicon having a high depth-to-width aspect ratio. These channels are then filled by depositing a metal such as gold to provide an inverse image of the trace image and thereby providing a robust x-ray mask tool.

Research Organization:
SANDIA CORP
DOE Contract Number:
AC04-94AL85000
Assignee:
Sandia National Laboratories (Livermore, CA)
Patent Number(s):
US 6477225
OSTI ID:
874863
Country of Publication:
United States
Language:
English

References (11)

Development of a low-cost x-ray mask for high-aspect-ratio MEM smart structures
  • Ajmera, Pratul K.; Stadler, Stefan; Abdollahi, Neda
  • 5th Annual International Symposium on Smart Structures and Materials, SPIE Proceedings https://doi.org/10.1117/12.320168
conference July 1998
Fabrication of HARM structures by deep-X-ray lithography using graphite mask technology journal February 2000
DEM technique: a new three-dimensional microfabrication technique for nonsilicon materials conference March 1999
Inexpensive, quickly producable X-ray mask for LIGA journal July 1999
Advanced silicon etching using high-density plasmas conference September 1995
X-Ray masks for very deep X-Ray lithography journal February 1998
High precision, low cost mask for deep x-ray lithography journal February 1998
Deep X-ray lithography for the production of three-dimensional microstructures from metals, polymers and ceramics journal March 1995
Fabrication of intermediate mask for deep x-ray lithography journal February 1998
Mask making for synchrotron radiation lithography journal December 1986
Fabrication of microstructures with high aspect ratios and great structural heights by synchrotron radiation lithography, galvanoforming, and plastic moulding (LIGA process) journal May 1986

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