Micromagnetics and microstructure of epitaxially grown Co and Co-Cr films suitable for perpendicular magnetic recording
- Lawrence Berkeley Lab., CA (United States)
- Hitachi Ltd., Kokubunji, Tokyo (Japan). Central Research Lab.
Highly c-axis oriented, single crystal films of Co{sub 1-x}Cr{sub x} (0{le} {times} {le} 0.3) have been grown epitaxially on mica substrates by e-beam evaporation. Films grown on Ru underlayers have an average grain size of 50--80nm, negligibe fcc content and very narrow c-axis dispersions. For Co films (x=0), the as-grown magnetization structure are mainly 180{degree} domain walls with a uniform distribution of cross-ties for thinner samples ({le} 300{Angstrom}), whilst thicker (>400{Angstrom}) ones show stripe domains. These images were analysed in detail to measure that wall widths and associated energy densities for as-grown, remanent and ac- magnetised samples. As expected, the magnetic properties of these films are composition dependent. However, for any Cr concentration, these films exhibit the largest saturation magnetisation when compared with either sputtered or evaporated samples. This enhancement can be attributed to a nanometer-scale segregation of Cr, which in these samples, which in these samples, could be particularly aided by the diffusion on the close-packed planes of the films with very narrow c-axis dispersions. Preliminary X-ray microanalysis and NMR data support this interpretation.
- Research Organization:
- Lawrence Berkeley Lab., CA (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC03-76SF00098
- OSTI ID:
- 10107715
- Report Number(s):
- LBL-35986; CONF-9410278-1; ON: DE95004681
- Resource Relation:
- Conference: Magnetic recording conference,Tokyo (Japan),10-14 Oct 1994; Other Information: PBD: Jul 1994
- Country of Publication:
- United States
- Language:
- English
Similar Records
Structural and magnetic properties of CoCrTa films with Cr
Effect of sputtered Co--Mo--Zr amorphous underlayer on the c -axis dispersion of sputtered Co--Cr films