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Title: Effect of sputtered Co--Mo--Zr amorphous underlayer on the c -axis dispersion of sputtered Co--Cr films

Journal Article · · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA)
DOI:https://doi.org/10.1116/1.577503· OSTI ID:6261285
;  [1];  [2]
  1. Odawara Works, Hitachi, Ltd., 2880 Kozu, Odawara, Kanagawa, 256, Japan (JP)
  2. Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185, Japan (JP)

Crystallographic orientations of Co--Cr films on Co--Mo--Zr amorphous underlayers, the morphology and the surface state of the Co--Mo--Zr film were investigated. The morphology of Co--Mo--Zr film depends on the substrate temperature and sputtering modes for deposition. When the effective substrate temperature is higher than a critical temperature (225 {degree}C), the surface is smooth and columnar structure disappears, and the {ital c}-axis dispersion ({Delta}{theta}{sub 50}) of Co--Cr film on this underlayer becomes small. Flat surface of Co--Mo--Zr film is one of the essential conditions for small {ital c}-axis dispersion of Co--Cr film. Effects of surface contamination are also examined. Carbon is effective to lower the surface energy and to improve the {ital c}-axis orientation of Co--Cr film.

OSTI ID:
6261285
Journal Information:
Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Vol. 9:2; ISSN 0734-2101
Country of Publication:
United States
Language:
English