Effect of sputtered Co--Mo--Zr amorphous underlayer on the c -axis dispersion of sputtered Co--Cr films
- Odawara Works, Hitachi, Ltd., 2880 Kozu, Odawara, Kanagawa, 256, Japan (JP)
- Central Research Laboratory, Hitachi, Ltd., Kokubunji, Tokyo 185, Japan (JP)
Crystallographic orientations of Co--Cr films on Co--Mo--Zr amorphous underlayers, the morphology and the surface state of the Co--Mo--Zr film were investigated. The morphology of Co--Mo--Zr film depends on the substrate temperature and sputtering modes for deposition. When the effective substrate temperature is higher than a critical temperature (225 {degree}C), the surface is smooth and columnar structure disappears, and the {ital c}-axis dispersion ({Delta}{theta}{sub 50}) of Co--Cr film on this underlayer becomes small. Flat surface of Co--Mo--Zr film is one of the essential conditions for small {ital c}-axis dispersion of Co--Cr film. Effects of surface contamination are also examined. Carbon is effective to lower the surface energy and to improve the {ital c}-axis orientation of Co--Cr film.
- OSTI ID:
- 6261285
- Journal Information:
- Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (USA), Vol. 9:2; ISSN 0734-2101
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CHROMIUM ALLOYS
CRYSTAL STRUCTURE
MORPHOLOGY
SURFACE CONTAMINATION
COBALT ALLOYS
MOLYBDENUM ALLOYS
ZIRCONIUM ALLOYS
CARBON
EXPERIMENTAL DATA
LAYERS
THIN FILMS
ALLOYS
CONTAMINATION
DATA
ELEMENTS
FILMS
INFORMATION
NONMETALS
NUMERICAL DATA
360102* - Metals & Alloys- Structure & Phase Studies