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Overlayer-induced perpendicular anisotropy in ultrathin Co films (invited)

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.355365· OSTI ID:7284255
; ;  [1]
  1. Department of Physics and the Optical Sciences Center, University of Arizona, Tucson, Arizona 85721 (United States)

We have used [ital in] [ital situ] polar Kerr effect measurements to study the magnetic anisotropy of MBE-grown [ital X]/Co/[ital Y] trilayers, where [ital X] and [ital Y] are combinations of the nonmagnetic metals Ag, Au, Cu, or Pd. The competition between the perpendicular anisotropy of the initial underlayer [ital X]/Co interface and the in-plane shape anisotropy of the Co film allows us to adjust the total anisotropy of the uncovered Co to be in plane and of moderate strength. In this way, we can measure hard-axis (perpendicular) polar hysteresis curves [ital in] [ital situ] as a function of overlayer [ital Y] coverage, and directly deduce the anisotropy field. Polar hysteresis curves were measured [ital in] [ital situ] for systematically varied Co and overlayer [ital Y] layer thicknesses 2 A[le][ital t][sub Co][le]20 A and 0 A[le][ital t][sub [ital Y]][le]100 A. We find, for particular combinations, the magnitude of the [ital X]/Co/[ital Y] perpendicular anisotropy is strongly peaked at [similar to]1 atomic layer overlayer [ital Y] coverage.

DOE Contract Number:
FG02-87ER45297
OSTI ID:
7284255
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 75:10; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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