Significant enhancement of the strength-to-resistivity ratio by using nanotwins in epitaxial Cu films
- Los Alamos National Laboratory
- TEXAS A&M
Epitaxial nanotwinned Cu films, with an average twin spacing ranging from 7 to 16 nm, exhibit a high ratio of strength-to-electrical resisitivity, -400 MPa({mu}{Omega}cm){sup -1}. The hardness of these Cu films approaches 2.8 GPa, and their electrical resistivities are comparable to that of oxygen-free high-conductivity Cu. Compared to high-angle grain boundaries, coherent twin interfaces possess inherently high resistance to the transmission of single dislocations, and yet an order of magnitude lower electron scattering coefficient, determined to be 1.5-5 x 10{sup -7} {mu}{Omega}cm{sup 2} at room temperature. Analytical studies as well as experimental results show that, in polycrystalline Cu, grain refinement leads to a maximum of the strength-to-resistivity ratio, -250 MPa({mu}{Omega}cm){sup -1}, when grain size is comparable to the mean-free path of electrons. However, in twinned Cu, such a ratio increases continuously with decreasing twin spacing down to a few nanometers. Hence nanoscale growth twins are more effective to achieve a higher strength-to-resistivity ratio than high-angle grain boundaries.
- Research Organization:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC52-06NA25396
- OSTI ID:
- 956654
- Report Number(s):
- LA-UR-08-07945; LA-UR-08-7945; TRN: US201016%%2339
- Country of Publication:
- United States
- Language:
- English
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