Photonuclear transmutation doping in gallium-based semiconductor materials
Patent
·
OSTI ID:1987020
The present invention relates to various high quality n-type and p-type doped gallium-based semiconductor materials, electronic components incorporating these materials, and processes of producing these materials. In particular, The present invention relates processes to achieve high quality, uniform doping of a whole wafer or a thin layer of gallium-based semiconductor materials for various applications such as a vertical power transistor or diode.
- Research Organization:
- Univ. of Missouri, Columbia, MO (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AR0000874
- Assignee:
- The Curators of the University of Missouri (Columbia, MO)
- Patent Number(s):
- 11,551,932
- Application Number:
- 16/905,506
- OSTI ID:
- 1987020
- Resource Relation:
- Patent File Date: 06/18/2020
- Country of Publication:
- United States
- Language:
- English
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