Metal-organic pulsed laser deposition for stoichiometric complex oxide thin films
Patent
·
OSTI ID:1925074
Methods and systems for forming complex oxide films are provided. Also provided are complex oxide films and heterostructures made using the methods and electronic devices incorporating the complex oxide films and heterostructures. In the methods pulsed laser deposition is conducted in an atmosphere containing a metal-organic precursor to form highly stoichiometric complex oxides.
- Research Organization:
- Univ. of Wisconsin, Madison, WI (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- FG02-06ER46327
- Assignee:
- Wisconsin Alumni Research Foundation (Madison, WI)
- Patent Number(s):
- 11,437,234
- Application Number:
- 16/985,455
- OSTI ID:
- 1925074
- Resource Relation:
- Patent File Date: 08/05/2020
- Country of Publication:
- United States
- Language:
- English
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