Phonon confinement and interface lattice dynamics of ultrathin high- k rare earth sesquioxide films: the case of Eu2O3 on YSZ(001)

Stankov, Svetoslav; Merkel, Dániel G.; Kalt, Jochen; Göttlicher, Jörg; Łażewski, Jan; Sternik, Małgorzata; Jochym, Paweł T.; Piekarz, Przemysław; Baumbach, Tilo; Chumakov, Aleksandr I.; Rüffer, Rudolf

doi:10.1039/d1na00728a

Title: Phonon confinement and interface lattice dynamics of ultrathin high- k rare earth sesquioxide films: the case of Eu₂O₃ on YSZ(001)

Journal Article · Tue Dec 07 00:00:00 EST 2021 · Nanoscale Advances

DOI:https://doi.org/10.1039/d1na00728a· OSTI ID:1903920

^[1];

^[2];

^[1]; Göttlicher, Jörg ^[1];

^[3];

^[3]; Baumbach, Tilo ^[1]; Chumakov, Aleksandr I. ^[4];

^[4]

Karlsruhe Institute of Technology (KIT) (Germany)
Hungarian Academy of Sciences, Budapest (Hungary); Centre for Energy Research, Budapest (Hungary)
Polish Academy of Sciences, Kraków (Poland)
ESRF-The European Synchrotron, Grenoble (France)

The spatial confinement of atoms at surfaces and interfaces significantly alters the lattice dynamics of thin films, heterostructures and multilayers. Ultrathin films with high dielectric constants (high-k) are of paramount interest for applications as gate layers in current and future integrated circuits. Here we report a lattice dynamics study of high-k Eu₂O₃ films with thicknesses of 21.3, 2.2, 1.3, and 0.8 nm deposited on YSZ(001). The Eu-partial phonon density of states (PDOS), obtained from nuclear inelastic scattering, exhibits broadening of the phonon peaks accompanied by up to a four-fold enhancement of the number of low-energy states compared to the ab initio calculated PDOS of a perfect Eu₂O₃ crystal. Our analysis demonstrates that while the former effect reflects the reduced phonon lifetimes observed in thin films due to scattering from lattice defects, the latter phenomenon arises from an ultrathin EuO layer formed between the thin Eu₂O₃ film and the YSZ(001) substrate. Thus, our work uncovers another potential source of vibrational anomalies in thin films and multilayers, which has to be cautiously considered.

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Research Organization:: Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)

Sponsoring Organization:: USDOE Office of Science (SC), Basic Energy Sciences (BES); Helmholtz Association; Federal Ministry of Education and Research (BMBF); Polish Ministry of Science and High Education

Grant/Contract Number:: AC05-00OR22725; VH-NG-625; 05K16VK4

OSTI ID:: 1903920

Journal Information:: Nanoscale Advances, Vol. 4, Issue 1; ISSN 2516-0230

Publisher:: Royal Society of ChemistryCopyright Statement

Country of Publication:: United States

Language:: English

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Title: Phonon confinement and interface lattice dynamics of ultrathin high- k rare earth sesquioxide films: the case of Eu₂O₃ on YSZ(001)