Controlling the Magneto-Optical Response in Ultrathin Films of EuO1–x via Interface Engineering with Ferroelectric BaTi2O5
Journal Article
·
· ACS Applied Materials and Interfaces
- University of Nebraska-Lincoln, NE (United States); University of Wyoming
- Oklahoma State University, Stillwater, OK (United States)
- Rutgers University, Piscataway, NJ (United States); University of Wyoming, Laramie, WY (United States)
- Canadian Light Source Inc., Saskatchewan (Canada)
- University of Wyoming, Laramie, WY (United States)
Utilizing pulsed laser deposition, a film of EuO1–x was deposited onto a Si(001) substrate with MgO buffer and compared to the same heterostructure with an additional BaTi2O5 thin film on top of the EuO1–x surface. X-ray diffraction (XRD) indicates the films crystallize into a preferred EuO(111) orientation; it also reveals the clear presence of EuSi2, which suggests Si or Eu diffuses across the MgO buffer layer. EuO1–x films exhibit a ferromagnetic (FM) signature and temperature-dependent exchange bias, indicated by MOKE measurements, suggesting the presence of a magnetic order well above the EuO Curie temperature with possible origins in charge carrier density near the interface. In comparison, an antiferromagnetic character persists well above the EuO Curie temperature of 69 K and the enhanced Curie temperature of 150 K for BaTi2O5 films grown on the EuO1–x films. Furthermore, the antiferromagnetic behavior is not seen in thicker EuO1–x thin films when integrated with other ferroelectric (FE) phases of the BaO–TiO2 system, suggesting an origin in the perturbed charge population at the BaTi2O5/EuO1–x interface.
- Research Organization:
- University of Wyoming, Laramie, WY (United States)
- Sponsoring Organization:
- National Science Foundation (NSF); USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- SC0020074
- OSTI ID:
- 2335340
- Journal Information:
- ACS Applied Materials and Interfaces, Journal Name: ACS Applied Materials and Interfaces Journal Issue: 7 Vol. 15; ISSN 1944-8244
- Publisher:
- American Chemical Society (ACS)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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