Activation energy of metastable amorphous Ge2Sb2Te5 from room temperature to melt
- Univ. of Connecticut, Storrs, CT (United States)
- Univ. of Connecticut, Storrs, CT (United States); Eskisehire Osmangasi Univ. (Turkey)
- Univ. of Connecticut, Storrs, CT (United States); Atilim Univ., Ankara (Turkey)
- IBM, Yorktown Heights, NY (United States). Thomas J. Watson Research Center
Resistivity of metastable amorphous Ge2Sb2Te5 (GST) measured at device level show an exponential decline with temperature matching with the steady-state thin-film resistivity measured at 858 K (melting temperature). This suggests that the free carrier activation mechanisms form a continuum in a large temperature scale (300 K – 858 K) and the metastable amorphous phase can be treated as a super-cooled liquid. The effective activation energy calculated using the resistivity versus temperature data follow a parabolic behavior, with a room temperature value of 333 meV, peaking to ~377 meV at ~465 K and reaching zero at ~930 K, using a reference activation energy of 111 meV (3kBT/2) at melt. Amorphous GST is expected to behave as a p-type semiconductor at Tmelt ~ 858 K and transitions from the semiconducting-liquid phase to the metallic-liquid phase at ~930 K at equilibrium. The simultaneous Seebeck (S) and resistivity versus temperature measurements of amorphous-fcc mixed-phase GST thin-films show linear S-T trends that meet S = 0 at 0 K, consistent with degenerate semiconductors, and the dS/dT and room temperature activation energy show a linear correlation. The single-crystal fcc is calculated to have dS/dT = 0.153 μV/K2 for an activation energy of zero and a Fermi level 0.16 eV below the valance band edge.
- Research Organization:
- Univ. of Connecticut, Storrs, CT (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES)
- Grant/Contract Number:
- SC0005038
- OSTI ID:
- 1499133
- Alternate ID(s):
- OSTI ID: 1454344
- Journal Information:
- AIP Advances, Vol. 8, Issue 6; ISSN 2158-3226
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
Web of Science
Modeling heterogeneous melting in phase change memory devices
|
journal | January 2019 |
Similar Records
Crystallization and Thermoelectric Transport in Semiconductor Micro- and Nanostructures Under Extreme Conditions
Metal-insulator transition and doping-induced phase change in Ge2Sb2Se5xTe5-5x