Oxidant K edge x-ray emission spectroscopy of UF4 and UO2
Journal Article
·
· Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
- Univ. of Wisconsin, Oshkosh, WI (United States). Dept. of Physics and Astronomy
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
- Research Organization:
- Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Chemical Sciences, Geosciences, and Biosciences Division
- Grant/Contract Number:
- AC02-05CH11231; AC52-07NA27344
- OSTI ID:
- 1435130
- Alternate ID(s):
- OSTI ID: 1418862; OSTI ID: 1458631
- Report Number(s):
- LLNL-JRNL-742730; ark:/13030/qt3q7977vp; TRN: US1802701
- Journal Information:
- Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films, Vol. 36, Issue 3; ISSN 0734-2101
- Publisher:
- American Vacuum SocietyCopyright Statement
- Country of Publication:
- United States
- Language:
- English
Cited by: 1 work
Citation information provided by
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