Two-photon absorption measurements of deep UV transmissible materials at 213 nm
- Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
We report on two photon absorption measurements at 213nm of deep UV transmissible media including LiF, MgF2, CaF2, BaF2, Sapphire (Al2O3) and high purity grades of fused-silica (SiO2). A high stability 24ps Nd:YAG laser operating at the 5th harmonic (213nm) was used to generate a high intensity, long Rayleigh length Gaussian focus inside the samples. The measurements of the Fluoride crystals and Sapphire indicate two photon absorption coefficients between 0.004 and 0.82 cm/GW. We find that different grades of fused silica performed near identically for two photon absorption, however, there are differences in linear losses associated with purity. A low two photon absorption cross section is measured for MgF2 making it an ideal material for the propagation of high intensity deep UV lasers.
- Research Organization:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- Sponsoring Organization:
- USDOE
- Grant/Contract Number:
- AC52-07NA27344
- OSTI ID:
- 1417267
- Alternate ID(s):
- OSTI ID: 1398840
- Report Number(s):
- LLNL-JRNL-728647; APOPAI; TRN: US1801013
- Journal Information:
- Applied Optics, Vol. 56, Issue 30; ISSN 1559-128X
- Publisher:
- Optical Society of AmericaCopyright Statement
- Country of Publication:
- United States
- Language:
- English
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