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Title: Atomic Layer Deposition of L-Alanine Polypeptide

Journal Article · · Journal of the American Chemical Society
DOI:https://doi.org/10.1021/ja5043403· OSTI ID:1237464
 [1];  [2];  [1];  [1];  [3];  [3];  [2];  [4];  [2];  [2];  [1];  [1];  [5]
  1. Univ. of New Mexico, Albuquerque, NM (United States)
  2. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
  3. T3 Scientific LLC, Blaine, MN (United States)
  4. Angstrom Thin Film Technologies LLC, Albuquerque, NM (United States)
  5. Sandia National Lab. (SNL-NM), Albuquerque, NM (United States); Univ. of New Mexico, Albuquerque, NM (United States)

L-Alanine polypeptide thin films were synthesized via atomic layer deposition (ALD). Rather, instead of using an amino acid monomer as the precursor, an L-alanine amino acid derivatized with a protecting group was used to prevent self-polymerization, increase the vapor pressure, and allow linear cycle-by-cycle growth emblematic of ALD. Moreover, the successful deposition of a conformal polypeptide film has been confirmed by FTIR, TEM, and Mass Spectrometry, and the ALD process has been extended to polyvaline.

Research Organization:
Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
Sponsoring Organization:
USDOE National Nuclear Security Administration (NNSA)
Grant/Contract Number:
AC04-94AL85000
OSTI ID:
1237464
Report Number(s):
SAND-2015-1894J; 579539
Journal Information:
Journal of the American Chemical Society, Vol. 136, Issue 45; ISSN 0002-7863
Publisher:
American Chemical Society (ACS)Copyright Statement
Country of Publication:
United States
Language:
English
Citation Metrics:
Cited by: 7 works
Citation information provided by
Web of Science

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Cited By (2)

Ultra-thin enzymatic liquid membrane for CO2 separation and capture journal March 2018
New development of atomic layer deposition: processes, methods and applications journal May 2019