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Title: Device and method for creating Gaussian aberration-corrected electron beams

Patent ·
OSTI ID:1236003

Electron beam phase gratings have phase profiles that produce a diffracted beam having a Gaussian or other selected intensity profile. Phase profiles can also be selected to correct or compensate electron lens aberrations. Typically, a low diffraction order produces a suitable phase profile, and other orders are discarded.

Research Organization:
Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC02-05CH11231
Assignee:
University of Oregon
Patent Number(s):
9,240,255
Application Number:
14/199,947
OSTI ID:
1236003
Resource Relation:
Patent File Date: 2014 Mar 06
Country of Publication:
United States
Language:
English

References (7)

Imaging and focusing of neutrons by a zone plate journal September 1980
Grain size determination in nano-scale polycrystalline aggregates by precession illumination-hollow cone dark field imaging in the transmission electron microscope journal January 2012
Electron Vortex Beams with High Quanta of Orbital Angular Momentum journal January 2011
Precession electron diffraction & automated crystallite orientation/phase mapping in a transmission electron microscope
  • Moeck, Peter; Rouvimov, Sergei; Hausler, Ines
  • 2011 IEEE 11th International Conference on Nanotechnology (IEEE-NANO), 2011 11th IEEE International Conference on Nanotechnology https://doi.org/10.1109/NANO.2011.6144300
conference August 2011
Phase mask with spatially variable diffraction efficiency patent April 2003
System and method for producing and using multiple electron beams with quantized orbital angular momentum in an electron microscope patent-application June 2012
Phase Plate patent-application August 2013

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