Holographic illuminator for synchrotron-based projection lithography systems
The effective coherence of a synchrotron beam line can be tailored to projection lithography requirements by employing a moving holographic diffuser and a stationary low-cost spherical mirror. The invention is particularly suited for use in an illuminator device for an optical image processing system requiring partially coherent illumination. The illuminator includes: (1) a synchrotron source of coherent or partially coherent radiation which has an intrinsic coherence that is higher than the desired coherence, (2) a holographic diffuser having a surface that receives incident radiation from said source, (3) means for translating the surface of the holographic diffuser in two dimensions along a plane that is parallel to the surface of the holographic diffuser wherein the rate of the motion is fast relative to integration time of said image processing system; and (4) a condenser optic that re-images the surface of the holographic diffuser to the entrance plane of said image processing system.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC03-76SF00098
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Number(s):
- 6,927,887
- Application Number:
- 09/981,500
- OSTI ID:
- 1175458
- Country of Publication:
- United States
- Language:
- English
Characterization of the accuracy of EUV phase-shifting point diffraction interferometry
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conference | June 1998 |
Modification of the coherence of undulator radiation
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journal | February 1995 |
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