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Title: Synchrotron-based EUV lithography illuminator simulator

Abstract

A lithographic illuminator to illuminate a reticle to be imaged with a range of angles is provided. The illumination can be employed to generate a pattern in the pupil of the imaging system, where spatial coordinates in the pupil plane correspond to illumination angles in the reticle plane. In particular, a coherent synchrotron beamline is used along with a potentially decoherentizing holographic optical element (HOE), as an experimental EUV illuminator simulation station. The pupil fill is completely defined by a single HOE, thus the system can be easily modified to model a variety of illuminator fill patterns. The HOE can be designed to generate any desired angular spectrum and such a device can serve as the basis for an illuminator simulator.

Inventors:
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1174963
Patent Number(s):
6,768,567
Application Number:
10/163,479
Assignee:
EUV LLC (Santa Clara, CA)
DOE Contract Number:  
AC03-76SF00098
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Naulleau, Patrick P. Synchrotron-based EUV lithography illuminator simulator. United States: N. p., 2004. Web.
Naulleau, Patrick P. Synchrotron-based EUV lithography illuminator simulator. United States.
Naulleau, Patrick P. 2004. "Synchrotron-based EUV lithography illuminator simulator". United States. https://www.osti.gov/servlets/purl/1174963.
@article{osti_1174963,
title = {Synchrotron-based EUV lithography illuminator simulator},
author = {Naulleau, Patrick P.},
abstractNote = {A lithographic illuminator to illuminate a reticle to be imaged with a range of angles is provided. The illumination can be employed to generate a pattern in the pupil of the imaging system, where spatial coordinates in the pupil plane correspond to illumination angles in the reticle plane. In particular, a coherent synchrotron beamline is used along with a potentially decoherentizing holographic optical element (HOE), as an experimental EUV illuminator simulation station. The pupil fill is completely defined by a single HOE, thus the system can be easily modified to model a variety of illuminator fill patterns. The HOE can be designed to generate any desired angular spectrum and such a device can serve as the basis for an illuminator simulator.},
doi = {},
url = {https://www.osti.gov/biblio/1174963}, journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {7}
}

Works referenced in this record:

Reconstruction of an object from the modulus of its Fourier transform
journal, January 1978


Application Of Local Reference Beam Holography To The Study Of Laser Beam Parameters
journal, August 1974