Synchrotron-based EUV lithography illuminator simulator
A lithographic illuminator to illuminate a reticle to be imaged with a range of angles is provided. The illumination can be employed to generate a pattern in the pupil of the imaging system, where spatial coordinates in the pupil plane correspond to illumination angles in the reticle plane. In particular, a coherent synchrotron beamline is used along with a potentially decoherentizing holographic optical element (HOE), as an experimental EUV illuminator simulation station. The pupil fill is completely defined by a single HOE, thus the system can be easily modified to model a variety of illuminator fill patterns. The HOE can be designed to generate any desired angular spectrum and such a device can serve as the basis for an illuminator simulator.
- Research Organization:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC03-76SF00098
- Assignee:
- EUV LLC (Santa Clara, CA)
- Patent Number(s):
- 6,768,567
- Application Number:
- 10/163,479
- OSTI ID:
- 1174963
- Country of Publication:
- United States
- Language:
- English
Reconstruction of an object from the modulus of its Fourier transform
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journal | January 1978 |
Application Of Local Reference Beam Holography To The Study Of Laser Beam Parameters
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journal | August 1974 |
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