10{times} reduction imaging at 13.4nm
- Sandia National Labs., Livermore, CA (United States); and others
A Schwarzschild imaging system has been designed to achieve 0.1 {mu}m resolution in a 0.4 mm diameter field of view when operated at a center wavelength of 13.4 nm. A decentered aperture is located on the convex primary resulting in an unobstructed numerical aperture of 0.08 and a corresponding depth of field of {plus_minus} 1 {mu}m. The Schwarzschild imaging objective is part of a five-reflection system containing the laser plasma source (LPS), condensing optics, turning mirror and reflection mask as shown in Figure 1. Extreme ultraviolet (EUV) radiation is generated by impinging a laser beam onto a copper target. The plasma source is driven by a Lambda Physik PLX 250 KrF excimer laser emitting 0.6 Joule, 20 ns pulses at a 200 Hz maximum repetition rate. Measurements of the source indicate that the full-width-half-maximum diameter is less than 100 {mu}m.
- Research Organization:
- Sandia National Labs., Albuquerque, NM (United States)
- Sponsoring Organization:
- USDOE, Washington, DC (United States)
- DOE Contract Number:
- AC04-94AL85000
- OSTI ID:
- 10173705
- Report Number(s):
- SAND-94-8602C; CONF-9409177-2; ON: DE94016612; BR: GB0103012
- Resource Relation:
- Conference: Optical Society of America conference on extreme ultraviolet lithography,Monterey, CA (United States),19-21 Sep 1994; Other Information: PBD: [1994]
- Country of Publication:
- United States
- Language:
- English
Similar Records
Characterization of an expanded-field Schwarzschild objective for extreme ultraviolet lithography
Phase-shifting point-diffraction interferometry at EUV wavelengths
Related Subjects
47 OTHER INSTRUMENTATION
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY
OPTICAL SYSTEMS
DESIGN
INTEGRATED CIRCUITS
INSPECTION
PMMA
IMAGES
IMAGE PROCESSING
FOCUSING
PERFORMANCE TESTING
SPATIAL RESOLUTION
426000
440600
440100
COMPONENTS
ELECTRON DEVICES AND CIRCUITS
OPTICAL INSTRUMENTATION
RADIATION INSTRUMENTATION