A debris free, electron beam driven, lithography source at 130 {angstrom}
- Research Organization:
- Los Alamos National Lab., NM (United States)
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 10113361
- Report Number(s):
- LA-UR-94-3785; CONF-9409177-6; ON: DE95003687; CRN: C/LANL--LC9310102; TRN: AHC29502%%115
- Resource Relation:
- Conference: Optical Society of America conference on extreme ultraviolet lithography,Monterey, CA (United States),19-21 Sep 1994
- Country of Publication:
- United States
- Language:
- English
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