A debris free, electron beam driven, lithography source at 130 [angstrom]
Los Alamos and Grumman are cooperatively investigating a debris free source for EUV lithography. This source utilizes the predicted anomalous energy loss of a short pulse electron beam in a preformed plasma to heat and ionize the ions to a charge state where efficient radiation at 130[angstrom] occurs. Accelerators developed for the free electron laser program at Los Alamos are used as the electron bunch source. These accelerators use a laser driven photocathode to produce 15 psec electron bunches containing 4 nC of charge with an energy of 15.5 MeV. These micropulses are produced at a repetition rate of 108 MHz and continue for the length of the rf macropulse energizing the accelerator cavities, typically 1--10 [mu]sec. The weakly ionized preformed plasma is created by purely classical collisional ionization caused by the initial few electron micropulses within the macropulse. When a critical electron density is reached, n[sub e] [approx equal] 1.6 [times] 10[sup 15]/[tau][sup 2] cm[sup [minus]3], where [tau] is the FWHM, in psec, of the electron bunch, the plasma responds collectively to the electron micropulse generating a large amplitude plasma wave. The plasma wave efficiently slows the high energy electron beam while heating the background plasma electrons. The initial electron population rapidly heats and then equilibrates with the bulk ion and electron populations in a few 10's of picoseconds. With neon as the dominant ionic species, an efficient filamentary radiator of line radiation near 130[angstrom] is created. A proof-of-principle experiment has been completed to demonstrate the anomalous energy loss process and bench-mark theoretical calculations at much lower densities appropriate to the existing 15 psec electron bunches.
- Research Organization:
- Los Alamos National Laboratory (LANL), Los Alamos, NM (United States)
- Sponsoring Organization:
- USDOE; USDOE, Washington, DC (United States)
- DOE Contract Number:
- W-7405-ENG-36
- OSTI ID:
- 6730152
- Report Number(s):
- LA-UR-94-3785; CONF-9409177-6; ON: DE95003687
- Resource Relation:
- Conference: Optical Society of America conference on extreme ultraviolet lithography, Monterey, CA (United States), 19-21 Sep 1994
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ACCELERATORS
RADIATION SOURCES
DESIGN
BEAM BUNCHERS
DEMONSTRATION PROGRAMS
ENERGY DEPOSITION
EXPERIMENTAL DATA
EXTREME ULTRAVIOLET RADIATION
PLASMA PRODUCTION
THEORETICAL DATA
DATA
ELECTROMAGNETIC RADIATION
INFORMATION
NUMERICAL DATA
RADIATIONS
ULTRAVIOLET RADIATION
430100* - Particle Accelerators- Design
Development
& Operation