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Title: Suppressed grain-boundary scattering in atomic layer deposited Nb:TiO{sub 2} thin films

We have fabricated high-quality thin films of the transparent conducting anatase Nb:TiO{sub 2} on glass substrates through atomic layer deposition, and a subsequent reductive heat treatment of the as-deposited amorphous films. Hall-effect measurements and Drude-fitting of the Vis-NIR spectra indicate that for lightly doped films deposited at temperatures around 170 °C, grain boundary scattering becomes negligible and the mobility is predominately limited by phonon-electron scattering inherent to the anatase lattice and by impurities. Simultaneously, such lighter doping leads to reduced plasma absorption, thereby improving material's performance as a transparent conductor.
Authors:
;  [1] ; ;  [2] ;  [3] ;  [3] ;  [4] ;  [3] ;  [2]
  1. Department of Chemistry, Aalto University, FI-00076 Aalto (Finland)
  2. Department of Chemistry, The University of Tokyo, Tokyo 113-0033 (Japan)
  3. (Japan)
  4. Kanagawa Academy of Science and Technology, Kawasaki 213-0012 (Japan)
Publication Date:
OSTI Identifier:
22486047
Resource Type:
Journal Article
Resource Relation:
Journal Name: Applied Physics Letters; Journal Volume: 107; Journal Issue: 19; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ABSORPTION; DEPOSITION; DOPED MATERIALS; GLASS; GRAIN BOUNDARIES; HALL EFFECT; HEAT TREATMENTS; IMPURITIES; MOBILITY; PLASMA; SCATTERING; SUBSTRATES; THIN FILMS; TITANIUM OXIDES