rf magnetron sputter deposition of transparent conducting Nb-doped TiO{sub 2} films on SrTiO{sub 3}

Journal Article · Thu Feb 01 04:00:00 EST 2007 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2434005· OSTI ID:20982660

Gillispie, Meagen A; Dabney, Matthew S; Perkins, John D; Ginley, David S ^[1]

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1. Iowa State University, Ames, Iowa 50011 (United States)

rf magnetron sputtering, an established and scalable large area deposition process, is used to deposit Nb:TiO{sub 2} and Ta:TiO{sub 2} films onto (100) SrTiO{sub 3} substrates at temperatures T{sub S} ranging from room temperature to 400 degree sign C. Optical, electrical, and structural properties similar to those reported for pulsed laser deposition grown films were obtained. In particular, the most conducting Ti{sub 0.85}Nb{sub 0.15}O{sub 2} films, grown at T{sub S}{approx_equal}375 degree sign C, are epitaxially oriented anatase films with conductivity of 3000 S cm{sup -1}, carrier concentration of 2.4x10{sup 21} cm{sup -3}, Hall mobility of 7.6 cm{sup 2} V{sup -1} s{sup -1}, and optical transparency T>80% from 400 to 900 nm. The conductivity is strongly correlated with the intensity of the anatase (004) x-ray diffraction peak.

• OSTI ID: 20982660
• Journal Information: Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 3 Vol. 101; ISSN JAPIAU; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CARRIER DENSITY
CARRIER MOBILITY
DOPED MATERIALS
ELECTRIC CONDUCTIVITY
ENERGY BEAM DEPOSITION
EPITAXY
HALL EFFECT
LASER RADIATION
NIOBIUM
OPACITY
PULSED IRRADIATION
SPUTTERING
STRONTIUM TITANATES
TANTALUM
TEMPERATURE DEPENDENCE
TEMPERATURE RANGE 0273-0400 K
TEMPERATURE RANGE 0400-1000 K
THIN FILMS
TITANIUM OXIDES
X-RAY DIFFRACTION