Enhanced third harmonic generation from the epsilon-near-zero modes of ultrathin films
- Sandia National Laboratories, P.O. Box 5800, Albuquerque, New Mexico 87185 (United States)
- National Research Council–AMRDEC, Charles M. Bowden Research Laboratory, Redstone Arsenal, Alabama 35898 (United States)
- Charles M. Bowden Research Laboratory, AMRDEC, U.S. Army RDECOM, Redstone Arsenal, Alabama 35898 (United States)
We experimentally demonstrate efficient third harmonic generation from an indium tin oxide nanofilm (λ/42 thick) on a glass substrate for a pump wavelength of 1.4 μm. A conversion efficiency of 3.3 × 10{sup −6} is achieved by exploiting the field enhancement properties of the epsilon-near-zero mode with an enhancement factor of 200. This nanoscale frequency conversion method is applicable to other plasmonic materials and reststrahlen materials in proximity of the longitudinal optical phonon frequencies.
- OSTI ID:
- 22398884
- Journal Information:
- Applied Physics Letters, Vol. 106, Issue 15; Other Information: (c) 2015 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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