Enhanced third harmonic generation from the epsilon-near-zero modes of ultrathin films

Luk, Ting S.; De Ceglia, Domenico; Liu, Sheng; Keeler, Gordon Arthur; Prasankumar, Rohit; Vincenti, Maria A; Scalora, Michael; Sinclair, Michael B.; campione, salvatore

doi:10.1063/1.4917457

Enhanced third harmonic generation from the epsilon-near-zero modes of ultrathin films

Journal Article · Mon Apr 13 00:00:00 EDT 2015 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4917457· OSTI ID:1235265

Luk, Ting S. ^[1]; De Ceglia, Domenico ^[2]; Liu, Sheng ^[1]; Keeler, Gordon Arthur ^[1]; Prasankumar, Rohit ^[1]; Vincenti, Maria A ^[2]; Scalora, Michael ^[2]; Sinclair, Michael B. ^[1]; campione, salvatore ^[1]

Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
National Research Council (AMRDEC), Redstone Arsenal, AL (United States)

We demonstrate, through our experimentation, efficient third harmonic generation from an indium tin oxide nanofilm (λ/42 thick) on a glass substrate for a pump wavelength of 1.4 μm. A conversion efficiency of 3.3 × 10^-6 is achieved by exploiting the field enhancement properties of the epsilon-near-zero mode with an enhancement factor of 200. Furthermore, this nanoscale frequency conversion method is applicable to other plasmonic materials and reststrahlen materials in proximity of the longitudinal optical phonon frequencies.

View Accepted Manuscript (DOE)

Research Organization:: Sandia National Laboratories (SNL-NM), Albuquerque, NM (United States)

Sponsoring Organization:: USDOE National Nuclear Security Administration (NNSA)

Grant/Contract Number:: AC04-94AL85000

OSTI ID:: 1235265

Alternate ID(s):: OSTI ID: 1420548
OSTI ID: 22398884

Report Number(s):: SAND2015--8183J; 604116

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 15 Vol. 106; ISSN 0003-6951

Publisher:: American Institute of Physics (AIP)Copyright Statement

Country of Publication:: United States

Language:: English

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