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Title: Temperature dependent structural, optical and hydrophobic properties of sputtered deposited HfO{sub 2} films

Hafnium oxide being high-k dielectric has been successfully utilized in electronic and optical applications. Being thermodynamically stable and having good mechanical strength, it can be used as a protective coating for outdoor HV insulators which are suffering from surface flashover problem due to contamination. In this paper, we are investigating the effect of substrate temperature on structural, optical and hydrophobic properties of hafnium oxide coating deposited over glass insulators by DC magnetron sputtering. X-ray diffraction is applied to determine the crystalline phase and crystallite size of the film. The morphology of the samples is examined using atomic force microscopy. The optical properties are studied using UV-vis-NIR spectrophotometer. The wettability of the film is investigated using contact angle meter. The thickness is measured using surface profilometer and verified through optical data. The relationship between substrate temperature with grain size, roughness, refractive index, and hydrophobicity is manifested. The maximum contact angle for HfO{sub 2} film was found to be 106° at 400°C.
Authors:
 [1] ;  [2] ; ;  [3] ;  [1]
  1. Department of Electrical Engineering, IIT Roorkee (India)
  2. (India)
  3. Institute Instrumentation Centre, IIT Roorkee (India)
Publication Date:
OSTI Identifier:
22264018
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 1576; Journal Issue: 1; Conference: OMTAT 2013: 2. international conference on optoelectronic materials and thin films for advanced technology, Kochi, Kerala (India), 3-5 Jan 2013; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
75 CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY; 36 MATERIALS SCIENCE; ATOMIC FORCE MICROSCOPY; DEPOSITS; DIELECTRIC MATERIALS; FILMS; GRAIN SIZE; HAFNIUM OXIDES; MAGNETRONS; SPUTTERING; SUBSTRATES; TEMPERATURE DEPENDENCE; X-RAY DIFFRACTION