Microstructure tuning facilitated photo-efficiency enhancement and environmental benign nature of HfO2/Mo/HfO2 multilayer films

Dubey, P.; Gomez, J.; Manandhar, S.; Shutthanandan, V.; Ramana, C. V.

doi:10.1016/j.solener.2017.12.021

Title: Microstructure tuning facilitated photo-efficiency enhancement and environmental benign nature of HfO₂/Mo/HfO₂ multilayer films

Journal Article · Mon Mar 26 00:00:00 EDT 2018 · Solar Energy

DOI:https://doi.org/10.1016/j.solener.2017.12.021· OSTI ID:1971626

Dubey, P. ^[1]; Gomez, J. ^[1]; Manandhar, S. ^[1]; Shutthanandan, V. ^[2]; Ramana, C. V. ^[1]

Univ. of Texas at El Paso, TX (United States)
Pacific Northwest National Lab. (PNNL), Richland, WA (United States). Environmental Molecular Sciences Lab. (EMSL)

In this work, nano-layered, multilayered films consisting of HfO₂(dielectric)/Mo(metal)/HfO₂(dielectric), (D/M/D architecture) with controlled layer thickness, chemistry and microstructure were demonstrated for efficient utilization of solar energy with well-designated spectral control. The effect of Mo metal interlayer on the energy performance and efficiency of HfO₂/Mo/HfO₂ multilayer films made by electron-beam deposition onto silicon and glass substrates has been evaluated. The Mo interlayer thickness [Mo(t)] was varied in the range of 5–25 nm while the top/bottom HfO₂ layer thickness was kept constant at ~50 nm. Structural, morphological and optical characterization was performed to understand the effect of Mo(t) induced microstructure on mechanical durability and optical behavior of the D/M/D multilayer films. Structural studies revealed that D/M/D multilayer films with relatively low Mo(t) were amorphous, while higher Mo(t) induces the amorphous-to-nanocrystalline microstructure transformation, which also induces surface roughening effects. The D/M/D multilayer film with Mo(t) = 20 nm, where the nano-columnar morphology of the D-M-D layers are aligned perpendicular to the substrate surface and exhibits the optimum spectral selectivity. Such microstructure and morphological tailoring also facilitates the environmentally friendly (self-cleaning/stain repellent) nature of these multilayer films by the high contact angle (~102°) achieved. Molybdenum interlayer facilitated higher contact angle leads to super-hydrophobic nature of the HfO₂/Mo/HfO₂ multilayered film surfaces. The low surface roughness values (0.2–0.8 nm), which are primarily due to Mo at the interface, of the HfO₂/Mo/HfO₂ multilayered films satisfy the general requirements of heat mirror applications. In addition, the microstructure of intermediate Mo layer and HfO₂-Mo interfaces significantly control the mechanical properties of D/M/D multilayer films. Optimal mechanical properties (hardness = 30 GPa, elastic modulus = 312 GPa, wear resistance = 0.094, adhesion strength = 2050 µN) have been obtained for Mo(t) = 20 nm D/M/D multilayer film. The mechanical response strongly supports flexible and wear resistive nature of HfO₂/Mo/HfO₂ multilayer films.

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Research Organization:: Pacific Northwest National Laboratory (PNNL), Richland, WA (United States). Environmental Molecular Sciences Laboratory (EMSL)

Sponsoring Organization:: USDOE Office of Science (SC), Biological and Environmental Research (BER); National Science Foundation (NSF)

DOE Contract Number:: AC06-76RL01830; ECCS-1509653; DMR-1205302

OSTI ID:: 1971626

Journal Information:: Solar Energy, Vol. 166; ISSN 0038-092X

Publisher:: Elsevier

Country of Publication:: United States

Language:: English

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Title: Microstructure tuning facilitated photo-efficiency enhancement and environmental benign nature of HfO₂/Mo/HfO₂ multilayer films