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Title: Development of X-ray Microscopy at IPOE

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3625340· OSTI ID:21608283
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  1. Institute of Precision Optical Engineering (IPOE), Physics Department, Tongji University, Shanghai 200092 (China)

In order to meet the different requirements of applications in synchrotron radiation and plasma diagnosis in China, focusing and imaging optics based on Kirkpatrick-Baez (KB) mirrors, compound refractive lenses (CRLs), and multilayer Laue lenses (MLLs) were studied in our lab. A one-dimensional KB microscope using mirrors with a dual-periodic multilayer coating was developed. The multilayer mirror can reflect both 4.75 keV (Ti K-line) and 8.05 keV (Cu K-line) simultaneously, which makes alignment easier. For hard x-ray microscopy, CRL was studied. Using a SU-8 resist planar parabolic CRL, a focal line of 28.8-{mu}m width was obtained. To focus hard x-rays to nanometer levels efficiently, an MLL was fabricated using a WSi{sub 2}/Si multilayer. The MLL consists of 324 alternating WSi{sub 2} and Si layers with a total thickness of 7.9 {mu}m. (Recently, a much thicker multilayer has been deposited with a layer number of n = 1582 and a total thickness of 27 {mu}m.) After deposition, the sample was sliced and polished into an approximate ideal aspect ratio (depth of the zone plate to outmost layer thickness); the measured results show an intact structure remains, and the surface roughness of the cross section is about 0.4 nm after grinding and polishing processes.

OSTI ID:
21608283
Journal Information:
AIP Conference Proceedings, Vol. 1365, Issue 1; Conference: 10. international conference on X-ray microscopy, Chicago, IL (United States), 15-20 Aug 2010; Other Information: DOI: 10.1063/1.3625340; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English